HSQ Hydrogen Silsesquioxane Resist
3 months ago Services Philadelphia 52 views Reference: 14639Contact us
Location: Philadelphia
Price: Contact us
DisChem's HSQ hydrogen silsesquioxane resist is a premium choice for electron beam lithography. This negative tone resist offers excellent pitch resolution and sensitivity, making it ideal for direct write thin film applications. Its outstanding etch resistance ensures high-fidelity pattern transfer, essential for advanced semiconductor manufacturing. Available with a short lead time and guaranteed shelf life, DisChem’s HSQ resist provides consistent, reliable performance for critical lithographic processes.
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Email ID : info@discheminc.com
Phone Number : +1(814)-772-6603
Address : 17295 Boot Jack Rd, Suite A PO Box 267 Ridgway, PA 15853 USA
