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HSQ Hydrogen Silsesquioxane Resist

5 months ago   Services   Philadelphia   61 views Reference: 14639

0.0 star

Location: Philadelphia

Price: Contact us


DisChem's HSQ hydrogen silsesquioxane resist is a premium choice for electron beam lithography. This negative tone resist offers excellent pitch resolution and sensitivity, making it ideal for direct write thin film applications. Its outstanding etch resistance ensures high-fidelity pattern transfer, essential for advanced semiconductor manufacturing. Available with a short lead time and guaranteed shelf life, DisChem’s HSQ resist provides consistent, reliable performance for critical lithographic processes.

Contact Us

Email ID : info@discheminc.com

Phone Number : +1(814)-772-6603

Address : 17295 Boot Jack Rd, Suite A PO Box 267 Ridgway, PA 15853 USA


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